Photoresist
0601201-158
[DEFINITION]
A photosensitive material used in photolithography.
[DESCRIPTION]
Photoresists consist of macromolecular compounds with
photosensitive functional molecules. There are water soluble and organic solvent soluble types.
To form a pattern, the sample is coated with photoresist, then prebaked, exposed, developed, and
postbaked. Photo-resists include positive photoresists that lose their exposed section by
development, and negative photoresists whose exposed section remains. To form sub-micrometer fine
patterns, various photoresists such as electronic beam and X-ray photoresists are provided exposure
to beam with different wavelengths.
[References]
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[Related Terms]
Photomask