X-ray lithography


A technique that transfers a fine pattern onto substrate by the use of X-rays.

Lithography technology at first used visible radiation, but with the increase in the degree of pattern integration, ultraviolet rays or shorter wave excimer lasers began to be used. Moreover, although batch exposure is difficult, lithography sometimes uses electron beams or ion beams. X-rays have a much shorter wavelength than the excimer laser and are therefore considered to be suited to higher integration. However, the optical systems have many problems; for example, an efficient and accurate lens for X-rays is difficult to produce.


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