X-ray lithography 0602101-220
A technique that transfers a fine pattern onto substrate by the use
Lithography technology at first used visible radiation, but with
the increase in the degree of pattern integration, ultraviolet rays or shorter wave excimer lasers
began to be used. Moreover, although batch exposure is difficult, lithography sometimes uses
electron beams or ion beams. X-rays have a much shorter wavelength than the excimer laser and are
therefore considered to be suited to higher integration. However, the optical systems have many
problems; for example, an efficient and accurate lens for X-rays is difficult to produce.