Vapor deposition


technology that deposits a substance from a vapour onto a solid surface.

Vapour deposition is a technique of forming a thin film by vaporizing a solid substance, typically a metal placed in vacuum, by means of heating or irradiation with electron beams, and exposing the substrate to the vapour to be deposited. The purity of the film depends on the pressure in the chamber. The adhesive strength of the film is relatively weak, and the crystalline structure may be imperfect because the film sticks through the force of simple adhesion. Therefore, the substrate is sometimes preheated to induce a chemical reaction after deposition, to strengthen the adhesion and to improve the crystalline structure.


[Related Terms]
Sputtering, Chemical vapor deposition (CVD)