Vapor deposition 0605102-214
technology that deposits a substance from a vapour onto a solid surface.
Vapour deposition is a technique of forming a thin film by vaporizing a
solid substance, typically a metal placed in vacuum, by means of heating
or irradiation with electron beams, and exposing the substrate to the vapour
to be deposited. The purity of the film depends on the pressure in the
chamber. The adhesive strength of the film is relatively weak, and the
crystalline structure may be imperfect because the film sticks through
the force of simple adhesion. Therefore, the substrate is sometimes preheated
to induce a chemical reaction after deposition, to strengthen the adhesion
and to improve the crystalline structure.
Sputtering, Chemical vapor deposition (CVD)