A photosensitive material used in photolithography.
Photoresists consist of macromolecular compounds with
photosensitive functional molecules. There are water soluble and organic solvent soluble types.
To form a pattern, the sample is coated with photoresist, then prebaked, exposed, developed, and
postbaked. Photo-resists include positive photoresists that lose their exposed section by
development, and negative photoresists whose exposed section remains. To form sub-micrometer fine
patterns, various photoresists such as electronic beam and X-ray photoresists are provided exposure
to beam with different wavelengths.