A photosensitive material used in photolithography.

Photoresists consist of macromolecular compounds with photosensitive functional molecules. There are water soluble and organic solvent soluble types. To form a pattern, the sample is coated with photoresist, then prebaked, exposed, developed, and postbaked. Photo-resists include positive photoresists that lose their exposed section by development, and negative photoresists whose exposed section remains. To form sub-micrometer fine patterns, various photoresists such as electronic beam and X-ray photoresists are provided exposure to beam with different wavelengths.


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