A process for polymers such as photoresists using laser-assisted
As polymers have a low heat resistance and excellent chemical
resistance, they cannot be thermally processed with a laser. Accordingly, in an oxygen atmosphere
active oxygen ions and radicals are generated by the photochemical effect of an excimer laser, and
the chemical reaction between these active particles and the polymers is used for processing. This
method uses polymers not only as the mask for etching but as the etching target itself.