Ion implantation
0601102-82
[DEFINITION]
A technique of adding impurity in material by the bombardment of
accelerated ions.
[DESCRIPTION]
Accelerating ions to several hundred keV to several MeV and
bombarding a specimen with the ions allows them to penetrate into the specimen, consequently
modifying material properties. Ion implantation is used for doping or surface modification of
materials in integrated circuit manufacturing.
[References]
(1)(4)(7)
[Related Terms]
Sputtering, Doping