Electron beam lithography
0601102-46
[DEFINITION]
A technique that generates a fine pattern onto substrate by the use
of electron beam.
[DESCRIPTION]
Pattern resolution depends on the wavelength of the rays. Electron
beam lithography improves the resolution by the use of electron beam. Therefore, combining electron
beam lithography with computer aided design (CAD) system makes lithography process flexible without
mask. However, it takes more exposure time compared to batch exposure because the electron beam has
to be scanned in raster or vector pattern.
[References]
(7)
[Related Terms]
Photolithography, Electron beam machining