Electron beam lithography


A technique that generates a fine pattern onto substrate by the use of electron beam.

Pattern resolution depends on the wavelength of the rays. Electron beam lithography improves the resolution by the use of electron beam. Therefore, combining electron beam lithography with computer aided design (CAD) system makes lithography process flexible without mask. However, it takes more exposure time compared to batch exposure because the electron beam has to be scanned in raster or vector pattern.


[Related Terms]
Photolithography, Electron beam machining