atomic layer deposition, ALD

[DEFINITION]
thin film deposition technique at atomic level resolution thickness.(IEC/2015)



[DESCRIPTION]

By changing the precursor gases sequentially, a chemical deposition process can be controlled down to the atomic or molecular scale. In the molecular beam epitaxy process, one of the related techniques, the deposited layer has the same crystal structure as that of the mono-crystalline substrate.



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[Related Terms]